The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Dec. 02, 2010
Chad A. Mirkin, Wilmette, IL (US);
Adam B. Braunschweig, New York, NY (US);
Jinan Chai, Spartanburg, SC (US);
Dan J. Eichelsdoerfer, Evanston, IL (US);
Louise R. Giam, Palo Alto, CA (US);
Xing Liao, Evanston, IL (US);
LU Shin Wong, Manchester, GB;
Chad A. Mirkin, Wilmette, IL (US);
Adam B. Braunschweig, New York, NY (US);
Jinan Chai, Spartanburg, SC (US);
Dan J. Eichelsdoerfer, Evanston, IL (US);
Louise R. Giam, Palo Alto, CA (US);
Xing Liao, Evanston, IL (US);
Lu Shin Wong, Manchester, GB;
Northwestern University, Evanston, IL (US);
Abstract
The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile