Xiaowei Cass Shang

Title: Innovations of Xiaowei Cass Shang

Introduction

Xiaowei Cass Shang is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of substrate polishing methods.

Latest Patents

Shang's latest patents include a CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers. This invention relates to the chemical mechanical polishing of substrates using an abrasive and a fluid composition, wherein certain organosulfonic acid compounds are utilized as oxidizers. It particularly addresses a method of polishing substrates comprising copper, tungsten, titanium, and/or polysilicon using a chemical-mechanical polishing system that incorporates organosulfonic acids with an electrochemical oxidation potential greater than 0.2V as an oxidizer.

Another significant patent is related to chemical-mechanical planarization using ozone. This invention involves the use of ozone as a reagent in chemical mechanical planarization, either in aqueous solution or as a gas directly impacting the surface to be planarized. The aqueous solution containing ozone may optionally include abrasive particles and/or additional CMP reagents co-dissolved with the ozone, such as carbonate and bicarbonate anions, and organic acids like formic, oxalic, acetic, and glycol. Abrasives that may be added include alumina, silica, spinel, ceria, and zirconia. Typical concentrations of ozone aqueous solution range from approximately 1 part-per-million up to saturation. Ammonium salts, particularly ammonium carbonate, facilitate planarization in cooperation with ozone-containing aqueous solutions. This invention allows for the planarization of low k dielectric materials, both organic and inorganic, as well as difficult-to-oxidize metals.

Career Highlights

Throughout his career, Xiaowei Cass Shang has worked with prominent companies such as EKC Technology Inc. and DuPont Air Products Nanomaterials, LLC. His experience in these organizations has contributed to his expertise in the field of chemical mechanical polishing.

Collaborations

Some of his notable coworkers include Robert J. Small and Melvin Keith Carter. Their collaboration has likely fostered innovation and advancements in their respective fields.

Conclusion

Xiaowei Cass Shang is a