The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2007
Filed:
Oct. 23, 2003
Melvin K. Carter, Los Gatos, CA (US);
Robert J. Small, Dublin, CA (US);
Xiaowei Cass Shang, Sunnyvale, CA (US);
Donald W. Frey, Pleasanton, CA (US);
Melvin K. Carter, Los Gatos, CA (US);
Robert J. Small, Dublin, CA (US);
Xiaowei Cass Shang, Sunnyvale, CA (US);
Donald W. Frey, Pleasanton, CA (US);
Dupont Air Products Nanomaterials LLC, Wilmington, DE (US);
Abstract
The invention relates to chemical mechanical polishing of substrates using an abrasive and a fluid composition, wherein certain organosulfonic acid compounds are used as oxidizers, and particularly relates to a method of polishing substrates comprising copper, tungsten, titanium, and/or polysilicon using a chemical-mechanical polishing system comprising organosulfonic acids having an electrochemical oxidation potential greater than 0.2V as an oxidizer.