Pleasanton, CA, United States of America

Xiaohu Tang

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaohu Tang. Retrieved from https://idiyas.com/inventor/xiaohu-tang-9j22ue9m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Xiaohu Tang: Charged-Particle Inspection Innovation

Introduction

Xiaohu Tang is an inventor based in Pleasanton, California, United States. His patent work concerns inspection technology for charged-particle systems, including methods for controlling how a beam charges a sample surface.

Latest Patents

Tang is associated with 1 patent, titled “System and Method for Inspection by Deflector Control in a Charged Particle System.” The invention describes apparatuses, systems, and methods that use deflector control to manage charging on a sample surface. A controller scans multiple sample nodes and adjusts the beam’s scan rate so that the charge deposited on each node can vary relative to other nodes. The system then generates and compares images to help detect defects associated with the scanned nodes.

Career Highlights

Tang’s listed patent reflects work on charged-particle beam inspection and defect detection. He is associated with ASML Netherlands B.V., a company whose technologies include semiconductor manufacturing and inspection systems.

Collaborations

Tang’s listed coworkers include Datong Zhang and Chih-hung Wang. Their names appear alongside his in connection with the patent information provided.

Conclusion

Xiaohu Tang’s patent describes a beam-control approach for charging sample surfaces and detecting defects through image comparison, highlighting his contribution to charged-particle inspection technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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