The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Feb. 09, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Datong Zhang, Milpitas, CA (US);

Chih-Hung Wang, San Jose, CA (US);

Oliver Desmond Patterson, San Jose, CA (US);

Xiaohu Tang, Pleasanton, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1474 (2013.01); H01J 37/263 (2013.01); H01J 37/265 (2013.01); H01J 2237/0048 (2013.01); H01J 2237/24592 (2013.01);
Abstract

Apparatuses, systems, and methods for providing beams for using deflector control to control charging on a sample surface of charged particle beam systems. In some embodiments, a controller including circuitry configured to scan a plurality of nodes of the sample to charge the plurality of nodes; adjust a scan rate of a beam such that a quantity of charge deposited on each node of the plurality of nodes varies with respect to at least one other node; generate a plurality of images; and compare the plurality of images to enable detection of a defect associated with any of the plurality of nodes of the sample.


Find Patent Forward Citations

Zhang, Datong. (2026). System and method for inspection by deflector control in a charged particle system (U.S. Patent No. 12744178). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12744178

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…