Xiaodong Yang

Title: Innovations of Inventor Xiaodong Yang

Introduction

Xiaodong Yang is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work primarily focuses on advanced transistor designs and on-chip capacitance techniques.

Latest Patents

One of Xiaodong Yang's latest patents is titled "Vertical transistor using a through silicon via gate." This patent describes a vertical transistor that utilizes a through silicon via as a gate. The structure includes a substrate, a via filled with conductive material, a deep well coupled to the via, and a source area with a source contact. This innovative design enhances the performance of vertical transistors in semiconductor applications.

Another significant patent is "On-chip through-body-via capacitors and techniques for forming same." This patent discloses techniques for providing on-chip capacitance using through-body-vias (TBVs). The TBV may be formed within a semiconductor layer, serving as one electrode of a TBV capacitor, while a dielectric layer acts as the dielectric body. This invention aims to improve the efficiency and functionality of on-chip capacitors.

Career Highlights

Xiaodong Yang is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has allowed him to contribute to cutting-edge technologies that shape the future of electronics.

Collaborations

Xiaodong has collaborated with talented coworkers, including Nidhi Nidhi and Yi Wei Chen. Their combined expertise fosters an environment of innovation and creativity within their projects.

Conclusion

Xiaodong Yang's contributions to semiconductor technology through his patents and work at Intel Corporation highlight his role as a significant inventor in the field. His innovative designs and techniques continue to influence advancements in electronics.