Company Filing History:
Years Active: 2001-2006
Title: Xiangbing Li: Innovator in Plasma Processing Technologies
Introduction
Xiangbing Li is a prominent inventor based in San Jose, CA, known for his contributions to plasma processing technologies. With a total of 4 patents, he has made significant advancements in methods that enhance the performance of semiconductor manufacturing processes.
Latest Patents
One of his latest patents is titled "Plasma preclean with argon, helium, and hydrogen gases." This invention provides a method and apparatus for precleaning a patterned substrate using a plasma mixture of argon, helium, and hydrogen. The addition of helium to the gas mixture surprisingly increases the etch rate compared to argon/hydrogen mixtures, particularly for argon concentrations below about 75% by volume. The method employs RF power that is capacitively and inductively coupled to the plasma, enhancing control over the etch properties.
Another notable patent is "Sequential sputter and reactive precleans of vias and contacts." This invention improves the fill and electrical performance of metals deposited on patterned dielectric layers. It involves etching apertures such as vias and trenches in the dielectric layer to enhance filling, followed by cleaning in the same chamber to reduce metal oxides. The process utilizes two distinct plasmas: the first consisting of argon and the second of hydrogen and helium, optimizing the cleaning and deposition processes.
Career Highlights
Xiangbing Li is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative plasma processing techniques that are crucial for the advancement of semiconductor manufacturing.
Collaborations
Throughout his career, Xiangbing has collaborated with notable colleagues, including Kenny King-Tai Ngan and Barney M Cohen. These collaborations have contributed to the development of cutting-edge technologies in the field.
Conclusion
Xiangbing Li's innovative work in plasma processing technologies has significantly impacted the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, making him a key figure in the field of semiconductor innovation.