Xianfeng Zhou

Title: Innovations of Xianfeng Zhou in Semiconductor Technology

Introduction

Xianfeng Zhou is a prominent inventor based in Meridian, ID, with an impressive portfolio of 21 patents. His innovative contributions primarily focus on semiconductor technology, specifically isolation trench techniques that enhance device performance and reliability.

Latest Patents

One of Xianfeng Zhou's latest inventions is titled "Isolation trench fill using oxide liner and nitride etch back technique with dual trench depth capability." This patent describes a sophisticated method for creating isolation trenches in semiconductor substrates. The process involves forming an oxide layer on a substrate with both smaller and larger isolation trenches. A nitride layer is then deposited on the oxide layer, completely filling the smaller trench and lining the larger one. Through a selective etching process, a recess is created in the nitride layer within the smaller trench, while the lining of the larger trench is partially removed. This innovative approach allows for the deposition of high-density plasma (HDP) oxide, which fills the trenches and is subsequently planarized to match the substrate surface. Additionally, an etching step can be performed to deepen the larger isolation trench before the HDP oxide is applied.

Career Highlights

Throughout his career, Xianfeng Zhou has made significant strides in the semiconductor industry. He has worked with notable companies such as Micron Technology Incorporated and Round Rock Research, LLC, where he leveraged his expertise to push the boundaries of semiconductor technologies. His innovative methodologies have contributed to advancements that benefit both the industry and consumers alike.

Collaborations

Xianfeng Zhou has collaborated with several talented professionals, including Mark Alan Helm and Michael A Smith. These partnerships have led to a rich exchange of ideas and have enhanced the development of groundbreaking technologies within their field.

Conclusion

Xianfeng Zhou's contributions to semiconductor technology reflect a deep commitment to innovation and advancement. His 21 patents, particularly the groundbreaking work on isolation trench fill techniques, showcase his importance as a leading inventor in the industry. Through his collaborations and career achievements, Zhou continues to influence the future of semiconductor development, paving the way for enhanced technologies in various applications.