Xian J Ning

Title: The Innovative Mind of Xian J Ning: Pioneering Patents in Microelectronics

Introduction: Xian J Ning, based in Mohegan Lake, NY, is a renowned inventor in the field of microelectronics, holding four patents that showcase his expertise and innovative spirit. His contributions are particularly significant in the methods of cleaning residues in microelectronic devices and the development of efficient dual damascene processes.

Latest Patents: Xian J Ning's latest patents reflect his commitment to advancing technology in microelectronics. One of his notable inventions is the "Dry Process for Cleaning Residues/Polymers After Metal Etch." This patent outlines a complete all-dry, low-temperature process for the removal of both organic and inorganic residues following metal etching on microelectronic devices. This innovative method involves several steps: rinsing a device with a solution of ammonium hydroxide and hydrogen peroxide, utilizing low-temperature GaSonics cleaning with fluorine-containing reactive gas, and concluding with the rinsing of the material using de-ionized water.

Another patent, titled "Dual Damascene with Bond Pads," presents an improved technique for forming bond pads through a dual damascene etch. This process includes a series of operative steps that ensure the proper formation of conductive layers and insulating layers in a manner that increases efficiency and effectiveness in microelectronics manufacturing.

Career Highlights: Xian J Ning's career spans significant contributions to leading technology companies, including Siemens and Infineon Technologies North America Corporation. His experience in these entities has provided him with a robust platform to develop innovative solutions that push the boundaries of microelectronics technology.

Collaborations: Throughout his career, Xian has collaborated with esteemed colleagues such as Rainer F Schnabel and Xiaoming Yin. These partnerships have fostered a collaborative environment that has undoubtedly contributed to his inventive processes and successful patent applications.

Conclusion: Xian J Ning's creative prowess is evident in his four patents, which mark significant advancements in the microelectronics field. His dedication to developing efficient processes for cleaning and fabricating microelectronic devices reflects not only his technical expertise but also his commitment to innovation. As he continues to forge new paths in technology, he remains an inspiring figure for current and future inventors.