Fontaine, France

Xavier Mellhaoui

This inventor holds 1 USPTO granted patent. Top assignee: STMicroelectronics. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xavier Mellhaoui. Retrieved from https://idiyas.com/inventor/xavier-mellhaoui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Xavier Mellhaoui

Introduction

Xavier Mellhaoui is a notable inventor based in Fontaine, France. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent in silicon etching methods. His work is recognized for its potential applications in various electronic devices.

Latest Patents

Mellhaoui holds a patent for a "Deep anisotropic silicon etch method." This method involves anisotropic plasma etching of a silicon wafer, maintained at a temperature ranging from -40°C to -120°C. The process comprises alternated and repeated steps that enhance the precision and efficiency of silicon etching.

Career Highlights

Xavier Mellhaoui is currently employed at STMicroelectronics, a leading global semiconductor company. His role involves research and development, where he applies his expertise in silicon etching to advance the company's technological capabilities. His innovative approach has contributed to the development of more efficient semiconductor devices.

Collaborations

Mellhaoui has collaborated with esteemed colleagues such as Rémi Dussart and Lawrence J Overzet. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Xavier Mellhaoui's contributions to the field of semiconductor technology through his innovative patent and collaborative efforts highlight his importance as an inventor. His work continues to influence advancements in electronic devices, showcasing the impact of his research and development endeavors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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