This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Wu-Der Wang: Innovator in Semiconductor Cleaning Processes
Introduction
Wu-Der Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of substrate cleaning processes. His innovative approaches have paved the way for advancements in the industry.
Latest Patents
Wu-Der Wang holds a patent titled "Pre-LDD wet clean recipe to gain channel length scaling margin beyond sub-0.1 µm." This patent describes a method of cleaning a substrate before and after an LDD implantation. The process involves several sequential steps, starting with the provision of a substrate that has a gate structure formed over it. The substrate is then cleaned using a wet clean process that includes NH4OH. Following this, an LDD implantation is performed to create LDD implants. Finally, the substrate undergoes another cleaning process that excludes NH4OH.
Career Highlights
Wu-Der Wang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
One of his notable collaborators is Jyh-Chyurn Guo, with whom he has worked on various projects within the semiconductor field.
Conclusion
Wu-Der Wang's contributions to semiconductor cleaning processes exemplify the importance of innovation in technology. His patent and career achievements reflect his commitment to advancing the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile