The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2003
Filed:
Mar. 20, 2002
Applicant:
Inventors:
Jyh-Chyurn Guo, HsinChu, TW;
Wu-Der Wang, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/4461 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/4461 ;
Abstract
A method of cleaning a substrate before and after an LDD implantation comprising the following sequential steps. A substrate having a gate structure formed thereover is provided. The substrate is cleaned by a wet clean process including NH OH. An LDD implantation is performed into the substrate to form LDD implants. The substrate is cleaned by a wet clean process excluding NH OH.