Woon-kyung Lee

Title: Woon-kyung Lee: Innovator in Semiconductor Memory Technology

Introduction

Woon-kyung Lee is a prominent inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of semiconductor memory technology, holding a total of 4 patents. His work focuses on enhancing the reliability and efficiency of nonvolatile memory devices.

Latest Patents

Woon-kyung Lee's latest patents include a mask ROM fabrication method and a nonvolatile semiconductor memory device with a multi-layer sidewall spacer structure. The mask ROM fabrication method provides a way to reduce the pitch of buried impurity diffusion regions. This process involves forming a gate insulation layer over a semiconductor substrate and creating parallel conductive layer patterns. Ion implantation is then performed using these patterns as a mask, leading to the formation of buried impurity diffusion regions. The nonvolatile memory device patent introduces a gate stack structure with a multi-layer sidewall spacer that enhances reliability. This structure protects the gate stack from mobile ions and reduces etching damage to source/drain regions.

Career Highlights

Woon-kyung Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the semiconductor field. His work has been instrumental in advancing memory technology, making significant strides in device reliability and performance.

Collaborations

Woon-kyung Lee has collaborated with notable colleagues, including He-jueng Lee and Joon-Sung Lee. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Woon-kyung Lee's contributions to semiconductor memory technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving device reliability and efficiency, making him a key figure in the industry.