Woo-Seok Park

Title: Innovations of Woo-Seok Park in Semiconductor Technology

Introduction

Woo-Seok Park is a prominent inventor based in Ansan-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on the development and manufacturing of advanced semiconductor devices.

Latest Patents

One of Woo-Seok Park's latest patents involves a semiconductor device that includes a first transistor in a first region of a substrate and a second transistor in a second region of the substrate. The first transistor comprises multiple first semiconductor patterns, a first gate electrode, a first gate dielectric layer, a first source/drain region, and an inner-insulating spacer. The second transistor features multiple second semiconductor patterns, a second gate electrode, a second gate dielectric layer, and a second source/drain region. Notably, the second gate dielectric layer extends between the second gate electrode and the second source/drain region, making contact with the second source/drain region. Importantly, the first source/drain region does not contact the first gate dielectric layer.

Career Highlights

Woo-Seok Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

Throughout his career, Woo-Seok Park has collaborated with notable colleagues, including Jung-Gil Yang and Geum-jong Bae. These collaborations have further enhanced his work and contributions to the field.

Conclusion

Woo-Seok Park's innovations in semiconductor technology demonstrate his significant impact on the industry. His patents reflect a commitment to advancing technology and improving semiconductor devices.