Goyang, South Korea

Woo In Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: K. C. Tech Co., Ltd., Samsung Electronics Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woo In Lee. Retrieved from https://idiyas.com/inventor/woo-in-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Woo In Lee: Innovator in Semiconductor Polishing Technology

Introduction

Woo In Lee is a notable inventor based in Goyang-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing compositions.

Latest Patents

Woo In Lee holds a patent for "Slurry compositions for polishing a metal layer and methods for fabricating semiconductor devices using the same." This innovative slurry composition includes polishing particles made of metal oxide, an oxidizer such as hydrogen peroxide, and a first polishing regulator selected from a group that includes phosphate, phosphite, hypophosphite, and metaphosphate. The oxidizer's content ranges from 0.01 wt % to 0.09 wt % concerning 100 wt % of the slurry composition for polishing the metal layer.

Career Highlights

Throughout his career, Woo In Lee has worked with prominent companies, including Samsung Electronics Co., Ltd. and K.C. Tech Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor fabrication.

Collaborations

Some of his notable coworkers include Seung Ho Park and Hyun Goo Kong. Their collaboration has likely contributed to the advancements in the technologies they have worked on together.

Conclusion

Woo In Lee's contributions to semiconductor polishing technology highlight his innovative spirit and dedication to advancing the field. His patent reflects a significant step forward in the methods used for fabricating semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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