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Years Active: 2012-2013
Title: Wonyoung Lee: Innovator in Atomic Layer Deposition Technologies
Introduction
Wonyoung Lee is a prominent inventor based in Stanford, California. He has made significant contributions to the field of atomic layer deposition (ALD) technologies. With a total of 3 patents, his work focuses on enhancing deposition techniques through innovative methods.
Latest Patents
One of Wonyoung Lee's latest patents is titled "Field-aided preferential deposition of precursors." This invention provides a method for area-selective atomic layer deposition, which involves positioning a scanning probe microscope (SPM) tip near a substrate surface. By establishing an electrical potential between the tip and the substrate, localized electrical effects are created, allowing deposition reactants to be applied in a defined pattern. This method enhances ALD reaction rates in specific areas.
Another notable patent is the "Prototyping station for atomic force microscope-assisted deposition of nanostructures." This invention features a localized nanostructure growth apparatus with a partitioned chamber. The first partition houses the SPM, while the second contains the ALD chamber. The hermetic isolation between these chambers prevents precursor vapor from damaging the microscope components and minimizes contaminants in the ALD chamber.
Career Highlights
Wonyoung Lee has worked with esteemed organizations such as Leland Stanford Junior University and Honda Motor Co., Ltd. His experience in these institutions has allowed him to develop and refine his innovative techniques in atomic layer deposition.
Collaborations
Throughout his career, Wonyoung Lee has collaborated with notable colleagues, including Neil Dasgupta and Friedrich B Prinz. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Wonyoung Lee's contributions to atomic layer deposition technologies demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a commitment to enhancing deposition methods, which can have significant implications in various applications.