Yongin, South Korea

Wonil Park

This inventor holds 2 USPTO granted patents. Top assignees: Ltc Co., Ltd., Ltc., Ltd, Samsung Display Co., Ltd.. Active years: 2025-2026.


% Patents Active = 50.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Wonil Park

Introduction

Wonil Park is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent. His work has been instrumental in advancing manufacturing processes for display apparatuses.

Latest Patents

Wonil Park holds a patent titled "Apparatus for manufacturing display apparatus and method of manufacturing display apparatus." This patent describes a method that includes removing an oxide layer formed on a substrate's surface using hydrofluoric acid gas and ammonia gas. The process also involves thermally treating the substrate after the oxide layer has been removed. The flow ratio between the hydrofluoric acid gas and ammonia gas is maintained between 0.8:1 and 1:1. This innovative approach enhances the efficiency and quality of display manufacturing.

Career Highlights

Throughout his career, Wonil Park has worked with prominent companies in the technology sector. He has been associated with Samsung Display Co., Ltd., where he contributed to advancements in display technologies. Additionally, he has worked with Tes Co., Ltd., further expanding his expertise in the field.

Collaborations

Wonil Park has collaborated with talented individuals such as Gugrae Jo and Hyoungsik Kim. These collaborations have fostered a creative environment that has led to innovative solutions in display technology.

Conclusion

Wonil Park's contributions to the field of display technology through his patent and career achievements highlight his role as an influential inventor. His innovative methods continue to shape the future of display manufacturing.

Profile summary based on public USPTO records.
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