The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Jun. 02, 2023
Samsung Display Co., Ltd., Yongin-si, KR;
Tes Co., Ltd, Yongin-si, KR;
Ltc Co., Ltd, Hwaseong-si, KR;
Gugrae Jo, Yongin-si, KR;
Hyoungsik Kim, Yongin-si, KR;
Woojin Cho, Yongin-si, KR;
Jongsoon Lee, Hwaseong-si, KR;
Hongjae Lee, Yongin-si, KR;
Kyusang Kim, Hwaseong-si, KR;
Seonjeong Kim, Hwaseong-si, KR;
Heejeon Ma, Yongin-si, KR;
Wonil Park, Yongin-si, KR;
Kicheon Byun, Yongin-si, KR;
Woojin Lee, Hwaseong-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
TES CO., LTD, Hwaseong-si, KR;
LTC CO., LTD, Hwaseong-si, KR;
Abstract
A method of manufacturing a display apparatus, the method includes removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas, and thermally treating the substrate from which the oxide layer has been removed. A flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.