Won-Suk Ahn

Title: The Innovative Contributions of Won-Suk Ahn

Introduction

Won-Suk Ahn, an esteemed inventor based in Yongin-si, South Korea, has made significant strides in the field of photolithography. With a portfolio that includes two patents, Ahn's work focuses on enhancing the efficiency and accuracy of phase shift masks, a critical component in semiconductor manufacturing.

Latest Patents

Among Ahn's notable innovations is the "Method of repairing phase shift mask." This technique involves exposing both the upper and side surfaces of the phase shift pattern on the mask. It selectively forms a passivation layer on the exposed patterns before subjecting the mask to a cleaning process. This method is implemented during photolithographic exposure sequences, ensuring that the transmittance of the phase shift patterns meets specific threshold values after cleaning.

His second patent, "Photo mask and method of correcting the transmissivity of a photo mask," addresses discrepancies in the transmissivity of photo masks used for pattern formation. This invention includes a transparent substrate with a light-shielding layer pattern that defines transmission sites. By doping the front surface of the transparent substrate with ions, Ahn's method aims to narrow the distribution of critical dimensions in the patterns produced, enhancing their fidelity to target specifications.

Career Highlights

Won-Suk Ahn is affiliated with Samsung Electronics Co., Ltd., a leading global company in technology and electronics. His contributions have substantial implications for the production processes in the semiconductor industry, showcasing his expertise in improving photolithographic techniques.

Collaborations

Ahn's inventive journey is complemented by his collaborations with talented peers, including Jeong-yun Lee and Seong-woon Choi. Together, they have fostered a creative environment that enhances innovation and drives advancements in their field.

Conclusion

Won-Suk Ahn exemplifies the ingenuity and dedication found within the realm of technological innovation. Through his patents and collaborative efforts, he continues to play a pivotal role in improving semiconductor fabrication processes, thereby contributing to the advancement of electronic devices worldwide.