Hwaseong, South Korea

Won Sik Nam

This inventor holds 3 USPTO granted patents. Top assignee: Nps Corporation. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Won Sik Nam. Retrieved from https://idiyas.com/inventor/won-sik-nam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018-2026

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3 patents (USPTO):Explore Patents

Title: Innovations of Won Sik Nam

Introduction

Won Sik Nam is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of substrate processing technology. With a total of 3 patents to his name, his work focuses on improving the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

His latest patents include an "Apparatus for processing substrate" and a "Substrate processing apparatus." The first invention relates to a substrate processing apparatus that features a chamber with a base frame designed to open on at least one face. It includes a main heat source aligned with isolation on the opened face of the base frame. This design allows for efficient use of space and reduced installation costs. The second patent also pertains to a substrate processing apparatus, which includes a chamber body with an inner space and a door for access. This apparatus is equipped with first and second susceptors and at least one heat source unit to enhance the heating process.

Career Highlights

Won Sik Nam is associated with NPS Corporation, where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

He collaborates with notable coworkers, including Kang Heum Yeon and Dae Seok Song, who contribute to his projects and innovations.

Conclusion

Won Sik Nam's contributions to substrate processing technology demonstrate his commitment to innovation and efficiency. His patents reflect a deep understanding of the technical challenges in this field, and his work continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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