The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Nov. 15, 2016
Applicant:

Nps Corporation, Hwaseong-Si, Gyeonggi-Do, KR;

Inventors:

Won Sik Nam, Hwaseong-Si, KR;

Kang Heum Yeon, Hwaseong-Si, KR;

Dae Seok Song, Hwaseong-Si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/67757 (2013.01);
Abstract

The present invention relates to a substrate processing apparatus, comprising, a chamber comprising a base frame formed to open at least a part of faces extending in vertical direction and horizontal direction, a main heat source provided in a row with isolation on an opened face of the base frame, and a block which is connected to the opened face of the base frame and forms a space in the base frame in which the substrate is processed; and a substrate support portion which is provided in the chamber and supports the substrate, and by integrating the chamber and the heat source, the size of the chamber itself is reduced, the space can be used efficiently with reduced installation space, and facilities cost can be saved.


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