Won Jun Jang

Title: Innovations of Won Jun Jang

Introduction

Won Jun Jang is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His work focuses on improving methods for processing chambers and substrates, which are crucial in various technological applications.

Latest Patents

Among his latest patents are two innovative methods: the internal chamber processing method and the substrate processing method. The internal chamber processing method involves raising and lowering pressure within a chamber to facilitate processing on components inside. This method enhances the efficiency of substrate processing by allowing for controlled conditions during operations. The substrate processing method includes a series of pressurizing and depressurizing operations, along with an annealing process that alters the pressure in a specific pattern while maintaining a higher temperature atmosphere. These advancements are vital for improving the quality and performance of processed substrates.

Career Highlights

Throughout his career, Won Jun Jang has worked with prominent companies such as Wonik Ips Co., Ltd. and Nextchip Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant technological advancements in substrate processing.

Collaborations

He has collaborated with talented individuals in the field, including Kyung Tea Park and Ah Young Hwang. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Won Jun Jang's contributions to substrate processing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.