Wolfgang Besenböck

Title: Wolfgang Besenböck: Innovator in Photolithography Technologies

Introduction

Wolfgang Besenböck is a notable inventor based in Munich, Germany. He has made significant contributions to the field of photolithography, particularly in methods that enhance the precision and efficiency of mask fabrication. With a total of 2 patents, his work reflects a deep understanding of the technological challenges in this area.

Latest Patents

Besenböck's latest patents include a "Method of grounding a photoblank to a holding device" and a "Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam." The first patent describes a retaining device for photo blanks, which features a ground element that can be manipulated to contact the electroconductive layer of the photo blank without lateral movement. The second patent outlines a method for fabricating mask patterns using a laser/electron beam with an elliptical cross-sectional shape, which allows for precise corner writing on the mask blank.

Career Highlights

Throughout his career, Wolfgang Besenböck has worked with prominent companies such as Infineon Technologies AG and Infineon Technologies North America Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in photolithography.

Collaborations

Besenböck has collaborated with notable professionals in his field, including Gernot Gödl and Gerd Unger. These collaborations have contributed to the advancement of technologies in photolithography and mask fabrication.

Conclusion

Wolfgang Besenböck's contributions to the field of photolithography through his innovative patents and collaborations highlight his role as a key figure in advancing technology. His work continues to influence the industry and pave the way for future innovations.