The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Mar. 29, 1999
Applicant:
Inventors:
Enio Luiz Carpio, Fishkill, NY (US);
Wolfgang Besenbock, Munich, DE;
Assignee:
Infineon Technologies North America Corp., San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A method for fabricating mask patterns in accordance with the present invention includes the steps of providing a mask blank for patterning, propagating a laser/electron beam having an elliptical cross-sectional shape onto the mask blank, the elliptical cross-sectional shape having an elongated axis and edges at opposite ends of the elongated axis and positioning the mask blank to write a pattern on the mask blank wherein the positioning includes employing the edges of the elliptical cross-sectional shape of the laser/electron beam to write corners of the pattern. A system is also included.