Infineon Technologies Ag

Infineon Technologies North America Corp.

Wolfgang Besenböck

Gerd Unger

Gernot Gödl

Alois Reiter

Enio Luiz Carpio

Andreas Oelmann

A retaining device for photo blanks, comprising a retaining member () with a supporting surface () for a photo blank () and a ground element () which can be brought into contact with an electroconductive layer () of said photo blank. The ground element is provided with a contact tip () which can be manipulated in such a way that it can be lowered substantially onto the photo blank () without any lateral movement in relation to said photo blank which is inserted into the retaining device.

Method of grounding a photoblank to a holding device

A method for fabricating mask patterns in accordance with the present invention includes the steps of providing a mask blank for patterning, propagating a laser/electron beam having an elliptical cross-sectional shape onto the mask blank, the elliptical cross-sectional shape having an elongated axis and edges at opposite ends of the elongated axis and positioning the mask blank to write a pattern on the mask blank wherein the positioning includes employing the edges of the elliptical cross-sectional shape of the laser/electron beam to write corners of the pattern. A system is also included.

Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam

Growing community of inventors

Munich, Germany

Wolfgang Besenböck