William V Dumas

Title: Innovations of William V Dumas

Introduction

William V Dumas is a notable inventor based in Essex Junction, VT (US). He has made significant contributions to the field of technology, particularly in the area of photo-masking for three-dimensional printed circuit boards. With a total of 8 patents to his name, Dumas continues to push the boundaries of innovation.

Latest Patents

Dumas's latest patents include a groundbreaking process for preparing a photo-mask for imaging three-dimensional objects. This method involves creating a photo-mask that is transparent and resistant to UV light degradation. The photo-mask features a contoured shape that is flexible enough to adapt to the surface irregularities of the three-dimensional substrate being photo-imaged. The design includes a pattern of tracks that are opaque to UV light, which aligns with the desired conductive metal trace pattern on the substrate. The preparation process involves dispensing track material in a boustrophedenous manner and pouring a membrane material over the tracks. Once the materials set, the photo-mask is formed, showcasing Dumas's innovative approach to enhancing circuit board technology.

Career Highlights

Dumas is currently employed at General Electric Company, where he applies his expertise in developing advanced technologies. His work has not only contributed to the company's success but has also advanced the field of electronics and manufacturing.

Collaborations

Throughout his career, Dumas has collaborated with talented individuals such as Donald Franklin Foust and Bradley R Karas. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

William V Dumas is a distinguished inventor whose work in photo-masking technology has made a significant impact on the industry. His innovative methods and collaborations continue to inspire advancements in the field of electronics.