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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5153084 B1

PDFFull Text
Date of Patent:
Oct. 06, 1992

Filed:

Sep. 10, 1990

Process for preparing a photo-mask for imaging three-dimensional objects

Applicant:
Inventors:

Donald Franklin Foust, Scotia, NY (US);

Bradley R Karas, Amsterdam, NY (US);

Edward J Lamby, Scotia, NY (US);

William V Dumas, Essex Junction, VT (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:

Deshmukh; Sudhir G.

Pittman; William H.

Primary Examiner:

Charles L Bowers, Jr

Assistant Examiner:

M Angebranndt

Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 2642711 ; 264279 ; 430270 ;
Abstract

A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by dispensing a track material in a boustrophedenous manner on the surfaces of the substrate being photo-imaged. A membrane material is then poured upon the surfaces containing the dispensed tracks. Once the materials of tracks and membrane set and are separated from the substrate, the photo-mask of the present invention is formed.

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Foust, Donald. (1992). Process for preparing a photo-mask for imaging three-dimensional objects (U.S. Patent No. 5153084). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5153084

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