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For the Inventor, By the Inventor

Boise, ID, United States of America

William T Rericha

USPTO Granted Patents = 25 

Average Co-Inventor Count = 4.2

ph-index = 12

Forward Citations = 889(Granted Patents)


Company Filing History:

goldMedal19 out of 38,023 
 
Micron Technology Incorporated
 patents
silverMedal6 out of 428 
 
Round Rock Research, LLC
 patents

Years Active: 1997-2014

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25 patents (USPTO):Explore Patents
1. 8674512 - Method to align mask patterns (2014-03-18),
2. 8657597 - Templates for use in imprint lithography and related intermediate template structures (2014-02-25),
3. 8598632 - Integrated circuit having pitch reduced patterns relative to photoithography features (2013-12-03),
4. 8338085 - Method to align mask patterns (2012-12-25),
5. 8216949 - Method for integrated circuit fabrication using pitch multiplication (2012-07-10),
6. 8207576 - Pitch reduced patterns relative to photolithography features (2012-06-26),
7. 8119535 - Pitch reduced patterns relative to photolithography features (2012-02-21),
8. 8048812 - Pitch reduced patterns relative to photolithography features (2011-11-01),
9. 7771917 - Methods of making templates for use in imprint lithography (2010-08-10),
10. 7718540 - Pitch reduced patterns relative to photolithography features (2010-05-18),
11. 7687408 - Method for integrated circuit fabrication using pitch multiplication (2010-03-30),
12. 7655387 - Method to align mask patterns (2010-02-02),
13. 7651951 - Pitch reduced patterns relative to photolithography features (2010-01-26),
14. 7629693 - Method for integrated circuit fabrication using pitch multiplication (2009-12-08),
15. 7547640 - Method for integrated circuit fabrication using pitch multiplication (2009-06-16),

Title: The Innovative Mind of William T Rericha: A Look into His Patents and Career

Introduction:

William T Rericha, a talented inventor based in Boise, ID, has made significant contributions to the field of technology with an impressive portfolio of 25 patents. His latest patents showcase his expertise in areas such as alignment tolerances in integrated circuits and template structures for imprint lithography.

Latest Patents:

1. Method to align mask patterns: Rericha's patent focuses on enhancing alignment tolerances between narrow and wider mask lines in integrated circuits. By using pitch multiplication and photolithography techniques, he has managed to increase alignment precision in circuit interconnects.

2. Templates for use in imprint lithography: Another one of Rericha's patents involves the creation of templates for imprint lithography. By developing intricate patterns with feature dimensions less than 100 nm, he has revolutionized the imprint lithography process.

Career Highlights:

Rericha has a rich professional background, with experience working at renowned companies such as Micron Technology Incorporated and Round Rock Research, LLC. His innovative spirit and dedication to technological advancements have propelled him to the forefront of the industry.

Collaborations:

Throughout his career, Rericha has had the privilege of collaborating with esteemed colleagues such as Gurtej S Sandhu and Mirzafer K Abatchev. Together, they have worked on cutting-edge projects that have pushed the boundaries of technological innovation.

Conclusion:

In conclusion, William T Rericha stands out as a visionary inventor who continues to make remarkable strides in the world of technology. His patents reflect his ingenuity and commitment to advancing various aspects of integrated circuits and lithography. With a strong foundation in research and development, Rericha's contributions are sure to inspire future generations of innovators in the field.

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