The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Feb. 17, 2010
Mirzafer K Abatchev, Boise, ID (US);
Gurtej Sandhu, Boise, ID (US);
Luan Tran, Meridian, ID (US);
William T Rericha, Boise, ID (US);
D. Mark Durcan, Boise, ID (US);
Mirzafer K Abatchev, Boise, ID (US);
Gurtej Sandhu, Boise, ID (US);
Luan Tran, Meridian, ID (US);
William T Rericha, Boise, ID (US);
D. Mark Durcan, Boise, ID (US);
Round Rock Research, LLC, Mt. Kisco, NY (US);
Abstract
A method lor integrated circuit fabrication is disclosed. A spacer pattern is provided including a plurality ot spacers in an array region of a partially-fabricated integrated circuit. Each spacer is at least partly defined by opposing open volumes extending along lengths of the spacers. A pattern is subsequently defined in a periphery region of the partially-fabricated integrated circuit. A consolidated pattern is formed by concurrently transferring the spacer pattern and the pattern in the periphery region into an underlying masking layer. The consolidated pattern is transferred to an underlying substrate.