William L Hamilton

Title: **William L. Hamilton: Innovator in Electrodeposition and Photoresist Technologies**

Introduction

William L. Hamilton, based in Chesapeake City, MD, is an accomplished inventor with two patents to his name. His innovative contributions primarily focus on processes for electrodeposition and the development of advanced photoresist compositions, demonstrating his expertise in chemical engineering and materials science.

Latest Patents

Hamilton's latest patents showcase his groundbreaking work. One patent details a "Process for Electrodeposition of Resist Formulations which Contain Metal." This invention involves the electrodeposition of a coating on an electroconductive article by immersing it in a specific photoimageable electrodeposition coating composition. This composition includes a water-soluble or water-dispersible polymer, an initiator, and a defined metal salt of a beta diketone, aimed at improving the efficiency of coating processes.

His second patent, titled "Positive Photoresist Compositions," provides an aqueous-processable, positive-working photoresist that boasts enhanced photospeed and aqueous development rates. Key components of this composition include a polymer with an acid number of about 25 and a substance that forms acid upon exposure to actinic radiation. The innovative positive photoresists are designed for use in printed circuit technologies, allowing application as liquid coatings, solid dry films, or from an electrodeposition bath.

Career Highlights

Hamilton is associated with E.I. DuPont de Nemours and Company, a leading entity in the development of materials and chemicals. His work has significantly impacted the field of electrodeposition and photoresist technologies, establishing him as a key figure in advancing these specialized areas.

Collaborations

Throughout his career, Hamilton has collaborated with notable professionals such as Richard Douglas Bauer and Gwendyline Y Chen. These partnerships have contributed to the successful development of innovative solutions within the realms of electrodeposition and photoresist applications.

Conclusion

William L. Hamilton's contributions to innovation in electrodeposition processes and photoresist technology highlight his role as a significant inventor. His patents reflect a commitment to advancing materials science and engineering, ultimately benefiting industries reliant on specialized coating technologies.