The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 1995

Filed:

Mar. 04, 1994
Applicant:
Inventor:

William L Hamilton, Chesapeake City, MD (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
2041816 ; 2041806 ; 430287 ; 430270 ;
Abstract

A process for electrodepositing a coating on an electroconductive article employed as an anode by immersing the electroconductive article in a photoimageable electrodeposition coating composition comprising an aqueous dispersion of (a) a water-soluble or water-dispersible polymer having an acid value of 20 to 300, and a number average molecular weight of not less than 300 with the proviso that when the polymer is unsaturated, it has an unsaturated equivalent of 150 to 3000, and when the polymer is saturated it is used in combination with an ethylenically unsaturated compound; (b) an initiator or initiating system, and (c) a defined metal salt of a .beta. diketone.


Find Patent Forward Citations

Hamilton, William. (1995). Process for electrodeposition of resist formulations which contain metal (U.S. Patent No. 5415749). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5415749

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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