Company Filing History:
Years Active: 2007-2010
Title: William D. Darlington: Innovator in Semiconductor Technology
Introduction
William D. Darlington is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that focus on improving the manufacturing processes of semiconductor devices.
Latest Patents
One of his latest patents is titled "Treatment for reduction of line edge roughness." This patent describes a method for reducing line edge roughness (LER) in a layer of photoresist. The method involves applying a layer of photoresist to a substrate, followed by patterning and annealing the layer in an atmosphere containing gases such as hydrogen, nitrogen, and fluorine-containing materials. The anneal can be performed either immediately after patterning or subsequent to the trim.
Another significant patent is "Method of making a semiconductor device using treated photoresist." This invention outlines a process for patterning a conductive layer to form gates of transistors. The process includes trimming the patterned photoresist to reduce its width and applying fluorine to enhance its hardness and selectivity to the conductive layer. The trimmed and fluorinated photoresist is then used as a mask to etch the conductive layer, forming conductive features that serve as gates for transistors.
Career Highlights
William D. Darlington has worked with prominent companies in the semiconductor industry, including Freescale Semiconductor, Inc. and North Star Innovations Inc. His work has significantly impacted the development of advanced semiconductor devices.
Collaborations
Throughout his career, Darlington has collaborated with notable professionals such as James Edward Vasek and Jinmiao James Shen. These collaborations have contributed to the advancement of technology in the semiconductor field.
Conclusion
William D. Darlington is a distinguished inventor whose work in semiconductor technology has led to innovative solutions for manufacturing processes. His patents reflect his commitment to enhancing the efficiency and effectiveness of semiconductor devices.