Mierlo, Netherlands

Willem Petrus Van Aaken

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Willem Petrus Van Aaken. Retrieved from https://idiyas.com/inventor/willem-petrus-van-aaken

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Willem Petrus Van Aaken: Inventor in Charged-Particle Inspection

Introduction

Willem Petrus Van Aaken is an inventor based in Mierlo, the Netherlands. His patent work addresses beam-position correction in charged-particle inspection, a technology relevant to producing accurate inspection images.

Latest Patents

The provided information lists one patent associated with Van Aaken: “Beam Position Displacement Correction in Charged Particle Inspection.” The patent describes a method and system for correcting errors in inspection images. It acquires beam-position measurements at two wafer-stage velocities, calculates the beam’s displacement at an intermediate velocity, and adjusts the beam position based on that calculation. Van Aaken is credited with 1 patent.

Career Highlights

Van Aaken is associated with ASML Netherlands B.V. His listed patent focuses on compensating for beam displacement as a wafer stage moves, helping address image errors during charged-particle inspection.

Collaborations

The provided information names Te-Yu Chen and Funda Sahin as Van Aaken’s coworkers. Their specific contributions to the patent are not stated.

Conclusion

Willem Petrus Van Aaken’s listed invention concerns correcting beam-position displacement to improve charged-particle inspection images, reflecting his work in a field connected to semiconductor inspection technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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