The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Nov. 02, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Martin Frans Pierre Smeets, Veldhoven, NL;

Niels Johannes Maria Bosch, Eindhoven, NL;

Willem Petrus Van Aaken, Mierlo, NL;

Jef Goossens, Bocholt, BE;

Te-Yu Chen, San Jose, CA (US);

Funda Sahin, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/15 (2006.01); H01J 37/14 (2006.01); H01J 37/147 (2006.01); H01J 37/153 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/1471 (2013.01); H01J 37/1475 (2013.01); H01J 37/20 (2013.01); H01J 2237/0209 (2013.01); H01J 2237/1536 (2013.01); H01J 2237/20221 (2013.01); H01J 2237/24578 (2013.01);
Abstract

A method and system for correcting inspection image error are disclosed. The method includes acquiring a set of first beam positions on a test wafer while a wafer stage supporting the test wafer moves at a first velocity; acquiring a set of second beam positions, corresponding to the set of first beam positions, on the test wafer while the wafer stage moves at a second velocity; calculating a beam position displacement of a beam while the wafer stage moves at a third velocity in a range of velocities from the first velocity to the second velocity; and adjusting a beam position of the beam based on the calculated beam position displacement.


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