This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jef Goossens and Charged-Particle Inspection
Introduction
Jef Goossens is an inventor associated with Bocholt, Belgium, and ASML Netherlands B.V. His work includes a patent addressing beam-position displacement correction in charged-particle inspection.
Latest Patents
The provided information lists 1 patent for Jef Goossens: “Beam Position Displacement Correction in Charged Particle Inspection.” The invention describes a method and system for correcting errors in inspection images. It acquires beam-position measurements at two wafer-stage velocities, calculates the beam’s displacement at an intermediate velocity, and adjusts the beam position based on that calculation.
Career Highlights
Goossens is associated with ASML Netherlands B.V., a company working in semiconductor manufacturing technology. The patent reflects an approach to improving the accuracy of charged-particle inspection images while a wafer stage is moving.
Collaborations
The provided information identifies Martin Frans Pierre Smeets as Goossens’s coworker. No further details about their collaboration are specified.
Conclusion
Jef Goossens’s listed patent focuses on correcting beam-position displacement to improve charged-particle inspection images during wafer-stage movement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile