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For the Inventor, By the Inventor

Vaduz, Liechtenstein

Werner Tabarelli

This inventor holds 7 USPTO granted patents. Top assignees: Perkin-Elmer Censor Anstalt, Other. Active years: 1982-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Werner Tabarelli. Retrieved from https://idiyas.com/inventor/werner-tabarelli

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 2,064(Granted Patents)


Location History:

  • Vaduz, LI (1982 - 1986)
  • Furstentum, LI (1986)
  • FL-9494 Schaan, LI (1992)

Company Filing History:

goldMedal4 out of 5 
 
Perkin-Elmer Censor Anstalt
 patents
silverMedal3 out of 834,513 
Other
 patents

Years Active: 1982-1992

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7 patents (USPTO):Explore Patents
1. 5146284 - Interferometer gas flow system (1992-09-08),
2. 4621922 - Device for the projection copying of masks onto a workpiece (1986-11-11),
3. 4619524 - Device for the projection copying of masks (1986-10-28),
4. 4592650 - Apparatus for projecting a pattern on a semiconductor substrate (1986-06-03),
5. 4592648 - Device for projection copying of masks onto a workpiece (1986-06-03),
6. 4509852 - Apparatus for the photolithographic manufacture of integrated circuit (1985-04-09),
7. 4346164 - Photolithographic method for the manufacture of integrated circuits (1982-08-24),

Title: Innovative Contributions of Werner Tabarelli

Introduction

Werner Tabarelli, an accomplished inventor based in Vaduz, Liechtenstein, has made significant strides in the field of technology with a total of seven patents to his name. His innovations focus on precision and efficiency in gas flow systems and equipment relevant to semiconductor manufacturing.

Latest Patents

Among his latest patents is the "Interferometer Gas Flow System," which showcases his expertise in manipulating gas flows for enhanced operational effectiveness. Another notable invention is a device for the projection copying of masks onto a workpiece. This device utilizes wideband adjustment light to illuminate adjustment marks, mitigating variations in the reflected signal's intensity. Remarkably, an achromatization device is integrated to correct color defects by covering only part of the total picture field that includes the adjustment marks.

Career Highlights

Throughout his career, Werner has worked with several reputable organizations, including PerkinElmer Censor Anstalt. His innovative contributions have not only advanced current technologies but have also set a precedent for future developments in the field.

Collaborations

Werner Tabarelli has collaborated with various talented individuals, notably Ernst W. Lobach and Herbert E. Mayer. Their joint efforts have contributed to the successful development and refinement of groundbreaking technologies, fostering an environment of shared innovation.

Conclusion

In conclusion, Werner Tabarelli stands out as a prominent inventor whose body of work demonstrates a commitment to advancing technology in significant ways. His patents reflect not only his innovative spirit but also his ability to collaborate effectively, ensuring impactful contributions to the world of science and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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