Perkin-elmer Censor Anstalt

Other

Werner Tabarelli

Ernst W Lobach

Herbert E Mayer

Interferometer gas flow system

To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to make variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the adjustment light is eliminated by an achromatization device which covers only a part of the total picture field which contains the adjustment marks.

Device for the projection copying of masks onto a workpiece

To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to eliminate variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the ajustment light is determined by spectroscopic means and taken into account when making the adjustment.

Device for the projection copying of masks

An apparatus for determining the focus state of a system for the projection exposure of a mask on a semiconductive substrate for producing integrated circuits without relatively displacing the mask, projection objective and substrate along the common optical axis, utilizes an arrangement for varying cyclically the optical path length for rays at least arising from a projected image on the substrate and running through the objective to a detector plane so that an intensity measurement of the light intensity at this plane indicates the path length required for sharpness and hence the focus state of the projection assembly.

Apparatus for projecting a pattern on a semiconductor substrate

For a device for projection copying of masks on a semiconductor substrate for the manufacture of integrated circuits, it is intended that the copying of an adjusting mark of the workpiece onto a sensor takes place by means of the projection lens, whereby the directly reflected beams of the light which makes visible the adjusting mark are masked out by a mirror, and the position-sensitive sensor is fastened at the underside of the frame carrying the mask.

Device for projection copying of masks onto a workpiece

Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Apparatus for the photolithographic manufacture of integrated circuit

In a photolithographic method for the manufacture of integrated circuits a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

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Vaduz, Liechtenstein

Werner Tabarelli