This inventor holds 3 USPTO granted patents. Top assignees: Carl-Zeiss-Smt Ag, Carl-Zeiss-Stiftung. Active years: 2003-2006.
Company Filing History:
Years Active: 2003-2006
Title: Werner Lang: Innovator in Semiconductor Lithography
Introduction
Werner Lang is a notable inventor based in Geislingen, Germany. He has made significant contributions to the field of semiconductor lithography, holding a total of 3 patents. His work focuses on developing advanced optical systems that enhance the precision and efficiency of lithographic processes.
Latest Patents
One of Lang's latest patents is an objective, particularly a projection objective for use in semiconductor lithography. This invention relates to an objective that comprises optical elements such as lenses and mirrors. According to the invention, at least a portion of the optical elements is provided with a reflective surface outside of the optically active area, serving as the reference surface for the optical element inside the objective. Another significant patent is a mounting apparatus for an optical element. In this case, an optical element has an inner mount and an outer mount, specifically a lens in a projection lens system for semiconductor lithography. The inner mount is connected to the outer mount via three circumferentially distributed articulations. Manipulators act on the articulations, allowing the inner mount to be displaceable. The articulations comprise a mechanism that transforms a radial movement into an axial movement.
Career Highlights
Throughout his career, Werner Lang has worked with prestigious companies, including Carl Zeiss SMT AG and Carl Zeiss Stiftung. His experience in these organizations has allowed him to refine his expertise in optical technologies and semiconductor applications.
Collaborations
Lang has collaborated with notable colleagues such as Alexander Kohl and Bernhard Gellrich. These partnerships have contributed to the advancement of innovative solutions in the field of semiconductor lithography.
Conclusion
Werner Lang's contributions to semiconductor lithography through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced optical systems.