The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2006
Filed:
Jul. 20, 2002
Applicants:
Alexander Kohl, Aalen, DE;
Hubert Holderer, Koenigsbronn, DE;
Werner Lang, Geislingen, DE;
Hartmut Brandenburg, Westhausen, DE;
Inventors:
Alexander Kohl, Aalen, DE;
Hubert Holderer, Koenigsbronn, DE;
Werner Lang, Geislingen, DE;
Hartmut Brandenburg, Westhausen, DE;
Assignee:
Carl Zeiss SMT AG, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 7/02 (2006.01); G02B 7/182 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to an objective, particularly a projection objective for use in semiconductor lithography, comprising optical elements such as lenses () and mirrors (). According to the invention, at least a portion of the optical elements () is provided with a reflective surface outside of the optically active area serving as the reference surface () for a the optical element inside the objective ().