Wenli Liu

Title: Innovations of Wenli Liu in Imaging Technology

Introduction

Wenli Liu is a prominent inventor based in Beijing, China, known for his contributions to imaging technology. He holds three patents that showcase his innovative approaches to enhancing image assessment and light source generation.

Latest Patents

One of his latest patents is an "Objective method for assessing high contrast resolution of image based on Rayleigh criterion and testing operating method." This invention introduces a novel objective method that combines the Rayleigh criterion with regional pixel intensity profiles. It allows for the simultaneous application to high contrast resolution images of CT equipment. The method enables objective assessment by utilizing the Rayleigh criterion after drawing regional pixel intensity profiles. The introduction of a normalized margin and the use of a Lanczos window function for interpolation processing on original images make this method practical and time-effective. It is designed to be user-friendly for both testers and CT equipment operators. This method can track subtle changes in high contrast resolution throughout the lifecycle of CT equipment, improving its efficiency and suitability for widespread application.

Another significant patent is the "High-diffusion-coefficient and high-brightness light source generation device." This device comprises a light source module, an optical fiber bundle, and an optical fiber hemisphere emitter. The light source module provides a plane light source that matches the size of the incident end of the optical fiber bundle. The exit ends of the optical fiber bundle are arranged on a hemispherical wall of the optical fiber hemisphere emitter, ensuring uniform light distribution. This innovative design enhances the brightness and diffusion of the light source, making it highly effective for various applications.

Career Highlights

Wenli Liu has worked at the National Institute of Metrology, China, where he has contributed significantly to research and development in metrology and imaging technologies. His work has been instrumental in advancing the field and improving measurement accuracy.

Collaborations

Wenli Liu has collaborated with notable colleagues, including Jianping Zhu and Baoyu Hong, who have contributed to his research endeavors.

Conclusion

Wenli Liu's innovative patents and contributions to imaging technology reflect his expertise and commitment to advancing the field. His work continues to influence the development of effective imaging solutions.