The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Dec. 15, 2016
National Institute of Metrology, China, Beijing, CN;
NATIONAL INSTITUTE OF METROLOGY, CHINA, Beijing, CN;
Abstract
The present invention relates to a novel objective method for assessing high contrast resolution of images based on Rayleigh criterion and a testing operating method. The novel objective method for assessing high contrast resolution of images based on Rayleigh criterion involves combining the Rayleigh criterion with regional pixel intensity profiles for simultaneous application to high contrast resolution images of CT equipment, which allows objective assessment by using the Rayleigh criterion after the drawing of the regional pixel intensity profiles; the introduction of a normalized margin and the use of a Lanczos window function for interpolation processing on original images enable a considerably practical, time-effective and operable objective assessment method that is convenient for testers to use and also easy for CT equipment operators to use. Such a method, just like a modulation transfer function (MTF) method, is capable of tracking subtle and slow changes of the high contrast resolution of CT equipment in the life cycle thereof objectively and accurately, thus allowing improvement of the use efficiency of the CT equipment in the life cycle thereof; therefore, the method is suitable for extensive popularization and application.