Company Filing History:
Years Active: 2024
Title: Innovations of Wenjia Hu in Capacitor Technology
Introduction
Wenjia Hu is a notable inventor based in Hefei, China, recognized for his contributions to capacitor technology. With a total of two patents to his name, he has made significant advancements in the field of electronic components.
Latest Patents
Wenjia Hu's latest patents include a method for forming a capacitor array structure and a method for forming double-sided capacitor structures. The first patent outlines a process that involves providing a substrate with exposed capacitor contacts, forming a bottom supporting layer, and creating a filling layer that varies in thickness across different regions. The second patent describes a method for creating a double-sided capacitor structure, which includes a base with multiple capacitor contacts and a stack structure that incorporates sacrificial and support layers. This innovative approach enhances the efficiency and functionality of capacitors in electronic devices.
Career Highlights
Wenjia Hu is currently employed at Changxin Memory Technologies, Inc., where he continues to develop cutting-edge technologies in memory and capacitor design. His work has contributed to the advancement of memory technologies, making significant impacts in the industry.
Collaborations
Wenjia collaborates with talented individuals such as Han Wu and Yong Lu, who contribute to his innovative projects and research endeavors.
Conclusion
Wenjia Hu's work in capacitor technology showcases his dedication to innovation and excellence in the field. His patents reflect a commitment to advancing electronic components, which will undoubtedly influence future developments in technology.