Weng-Cheng Chen

Title: Weng-Cheng Chen: Innovator in Semiconductor Technology

Introduction

Weng-Cheng Chen is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of barrier layers for semiconductor devices. With a total of 2 patents to his name, Chen continues to push the boundaries of innovation in this critical area of electronics.

Latest Patents

One of Weng-Cheng Chen's latest patents is a method of fabricating a tantalum nitride barrier layer in an ultra-low threshold voltage semiconductor device. This innovative method involves forming a high-k dielectric layer over a semiconductor substrate. Following this, a tantalum nitride barrier layer is created on the high-k dielectric layer, with a Ta:N ratio maintained between 1.2 and 3. The process further includes the formation of a plurality of first metal gates on the tantalum nitride barrier layer, which are then patterned, leading to the creation of a second metal gate on the same layer.

Career Highlights

Weng-Cheng Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing the performance and efficiency of semiconductor devices through innovative fabrication techniques.

Collaborations

Throughout his career, Chen has collaborated with notable colleagues, including Chi-Cheng Hung and Yu-Sheng Wang. These partnerships have contributed to the advancement of semiconductor technologies and the successful development of new methods in the field.

Conclusion

Weng-Cheng Chen stands out as a key figure in semiconductor innovation, with his patents reflecting a commitment to advancing technology. His work at Taiwan Semiconductor Manufacturing Company Limited and collaborations with esteemed colleagues further underscore his impact on the industry.