Company Filing History:
Years Active: 2006
Title: **Wen-Tien Hung: Innovator in Photomask Technology**
Introduction
Wen-Tien Hung is a notable inventor based in Taipei, Taiwan, renowned for his contributions to photomask technology. With two patents to his name, his work has significantly advanced the field of semiconductor manufacturing.
Latest Patents
Among Wen-Tien Hung's latest innovations are two key patents:
1. **Phase Shift Mask**: This invention outlines a phase shift mask that comprises a transparent substrate, a semi-dense pattern, and a dense pattern. The semi-dense pattern is specifically designed with a series of phase shift regions interspersed with non-phase shift regions. Conversely, the dense pattern also incorporates a mix of phase shift regions, non-phase shift regions, and non-transparent regions, enhancing the utility of photomasks in industry.
2. **Photomask Pattern**: This patent presents a photomask pattern on a substrate featuring a main pattern along with a sub-resolution assistant feature. The sub-resolution assistant feature is strategically positioned adjacent to the main pattern and comprises first and second assistant features. Notably, there is a phase difference of 180° between the assistant features and the main pattern, which effectively increases the exposure resolution of the photomask.
Career Highlights
Wen-Tien Hung is associated with United Microelectronics Corporation, a leading player in the semiconductor industry. His advancements in photomask technologies have helped bolster the precision and efficiency of semiconductor manufacturing processes, making significant impacts in the field.
Collaborations
During his career, Wen-Tien Hung has collaborated with talented individuals such as Chin-Lung Lin and Chuen-Huei Yang. These partnerships have been instrumental in fostering innovation and pushing the boundaries of current technologies in their shared field.
Conclusion
Wen-Tien Hung's contributions through his patents reflect the ongoing advancements in semiconductor technology. As an inventor, his work continues to shape the future of photomask applications, benefiting various sectors within the industry. His career at United Microelectronics Corporation highlights the importance of collaborative innovation in driving technological progress.