Wen-Sheng Liao

Title: Innovations of Inventor Wen-Sheng Liao

Introduction

Wen-Sheng Liao is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods for fabricating trench isolation, which are crucial for the performance and reliability of semiconductor devices.

Latest Patents

Wen-Sheng Liao's latest patents include a "Method for Fabricating Trench Isolation" and a "Method for Fabricating Trench Isolations with High Aspect Ratio." The first patent describes a method for forming trench isolation by providing a semiconductor substrate with an opening, forming a mask layer, and filling the trench with a first insulating layer. The second patent outlines a process for achieving void-free trench isolation with high aspect ratio through low pressure chemical vapor deposition and high density plasma chemical vapor deposition, followed by chemical-mechanical polishing.

Career Highlights

Throughout his career, Wen-Sheng Liao has worked with prominent companies such as Nan Ya Technology Corporation and Tatung Company. His expertise in semiconductor fabrication has made him a valuable asset in the industry.

Collaborations

Wen-Sheng Liao has collaborated with several professionals, including Sheng-Wei Yang and Chih-How Chang, who have contributed to his innovative projects.

Conclusion

Wen-Sheng Liao's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative methods for trench isolation continue to impact the industry positively.