Wen-Kuang Tai

Title: Wen-Kuang Tai: Semiconductor Process Equipment Inventor.

Introduction

Wen-Kuang Tai is an inventor associated with Hsinchu, Taiwan, and United Microelectronics Corporation. Her work includes inventions for semiconductor manufacturing equipment and processes. Tai is credited with 2 patents.

Latest Patents

Tai’s listed patents address furnace design and oxide-growth stability in semiconductor fabrication.

The “Horizontal-Type Silicon-Nitride Furnace” describes a two-tube furnace for forming silicon nitride layers on wafers. An inner tube sits within an outer tube and has separate gas inlets for supplying reaction gases. A paddle carrying the wafers is mounted on a door that seals the outer tube, while a heater surrounds its side. The arrangement is designed to support controlled processing of wafers inside the inner tube.

The “Apparatus for Preventing the Unstable Growth Rate of Oxide” addresses variations in oxide growth when wet oxidation is followed by dry oxidation. It uses insulating sleeves around the inlet pipes of a horizontal field-oxidation tube to limit water vapor remaining in the pipes and help stabilize oxide growth.

Career Highlights

Tai’s patent work reflects a focus on practical challenges in semiconductor processing, including furnace configuration, gas delivery, and oxidation control. Her inventions are associated with United Microelectronics Corporation, a semiconductor company based in Taiwan.

Collaborations

Tai’s listed coworkers include Ching-Li Shih and Kuo-Tung Chu. Their shared association with semiconductor-related patent work connects them to the broader engineering and innovation environment at United Microelectronics Corporation.

Conclusion

Wen-Kuang Tai’s patents address equipment and process-control challenges in semiconductor manufacturing, with particular attention to silicon-nitride furnace design and consistent oxide growth.