Wen-Chin Chen

Title: Innovative Contributions of Inventor Wen-Chin Chen

Introduction

Wen-Chin Chen is a prominent inventor based in Kaohsiung, Taiwan, known for his significant contributions to the semiconductor industry. With a total of six patents to his name, his work primarily revolves around semiconductor structures and the innovative methodologies surrounding them.

Latest Patents

Among his latest patents is the invention of a semiconductor epitaxy bordering isolation structure. This method entails providing a semiconductor structure that includes an active region and an adjacent isolation structure. The active region features source and drain regions that sandwich a channel region for a transistor, along with a gate structure positioned over the channel region. The process includes etching a trench in one of the source and drain regions, exposing a portion of a sidewall of the isolation structure. Subsequently, a first semiconductor layer is epitaxially grown in the trench, followed by a second semiconductor layer over the first. An important step in this patent involves changing the crystalline facet orientation of part of the top surface of the second semiconductor layer through an etching process, which is then succeeded by the epitaxial growth of a third semiconductor layer over the second.

Career Highlights

Wen-Chin Chen's career has included notable roles within prestigious organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His expertise and innovative thinking have greatly influenced advancements in semiconductor technology.

Collaborations

Throughout his career, Wen-Chin Chen has worked alongside talented professionals, including Cheng-Yi Wu and Yu-Hung Cheng, fostering an environment of collaboration that enhances the innovative capabilities of his projects.

Conclusion

Wen-Chin Chen's inventive prowess and dedication to advancing semiconductor technology make him a valuable figure in the field. His contributions, particularly through his latest patents, highlight the ongoing evolution of semiconductor structures, reflecting both his professional achievements and the potential for future innovations.