Company Filing History:
Years Active: 2016-2021
Title: Innovations by Wen-Chieh Hsieh
Introduction
Wen-Chieh Hsieh is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in gas monitoring and image sensor design. With a total of two patents to his name, Hsieh's work reflects a commitment to advancing technology in wafer processing systems and image sensors.
Latest Patents
Hsieh's latest patents include a method for monitoring gas in a wafer processing system. This innovative method involves producing an exhaust flow in an exhausting conduit from a processing chamber. It also includes placing a gas sensor in fluid communication with a detection point located in the exhausting conduit via a sampling tube. The detection point is strategically positioned away from the through hole, allowing for accurate gas condition detection. The method further analyzes the gas condition to determine if it falls within a specified range of values.
Another significant patent is the apparatus and method for reducing dark current in image sensors. This method involves providing a backside illuminated image sensor wafer and depositing multiple layers of passivation to enhance performance. The innovative approach aims to improve the efficiency and reliability of image sensors, which are crucial in various applications.
Career Highlights
Wen-Chieh Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.
Collaborations
Hsieh has worked alongside notable colleagues, including Su-Yu Yeh and Ko-Bin Kao. Their collaborative efforts have fostered an environment of innovation and creativity, leading to the development of impactful technologies.
Conclusion
Wen-Chieh Hsieh's contributions to the field of semiconductor technology through his patents demonstrate his expertise and dedication to innovation. His work continues to influence advancements in wafer processing and image sensor design, solidifying his reputation as a leading inventor in the industry.