Wen-Cheng Chang

Title: The Innovative Mind of Wen-Cheng Chang

Introduction

Wen-Cheng Chang is a distinguished inventor based in Hsin-Chu, Taiwan, with an impressive portfolio of six patents. His contributions to the field of integrated circuits and image sensors highlight his expertise and innovative approach toward technological advancements.

Latest Patents

Wen-Cheng's work includes significant patents focusing on advanced materials and device layouts. One of his latest patents, titled "Method for making high-sheet-resistance polysilicon resistors for integrated circuits," presents a revolutionary process utilizing a two-layer polysilicon technique. This innovation allows for the creation of a high-sheet-resistance polysilicon resistor, which is critical for optimizing circuit performance. The design minimizes resistivity variations through in-situ doping and employs a carefully engineered thickness of less than 1,000 Angstroms to enhance sheet resistance for mixed-mode applications.

Another notable patent is centered around the "Layout of an image sensor for increasing photon induced current." This patent describes novel device layouts that significantly bolster the photon current in metal oxide semiconductor image sensors—whether they be NMOS, PMOS, or CMOS. By strategically designing the drain region of these sensors, which takes the shape of parallel fingers or spirals, Chang has effectively increased the illuminated area of the depletion region, thus enhancing the sensor's efficiency.

Career Highlights

Wen-Cheng Chang is affiliated with Taiwan Semiconductor Manufacturing Company Limited, where his innovative efforts contribute to the advancement of semiconductor technology. His six patents stand as testaments to his commitment to research and development in this fast-evolving field, showcasing his ability to blend theoretical knowledge with practical applications.

Collaborations

Throughout his career, Wen-Cheng has worked alongside talented colleagues, including Yu-Ming Tsui and Shung-Jen Yu. Their collaborative efforts have played a crucial role in fostering an innovative environment, leading to the development of cutting-edge technologies and patents that push the boundaries of what is possible in semiconductor design.

Conclusion

Wen-Cheng Chang's work exemplifies the spirit of innovation in the realm of electrical engineering and materials science. His patents not only contribute to the enhancement of integrated circuits and image sensors but also inspire future advancements in technology. As the industry continues to evolve, inventors like Chang will pave the way for new possibilities, driving progress in electronic design and efficiency.