Company Filing History:
Years Active: 2017-2018
Title: Wen-Chao Shen: Innovator in Semiconductor Technology
Introduction
Wen-Chao Shen is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative semiconductor device structures that enhance performance and efficiency.
Latest Patents
Wen-Chao Shen's latest patents include advanced semiconductor device structures. One patent describes a semiconductor device structure that features a semiconductor substrate and a gate stack positioned above it. This gate stack consists of a first insulating layer, a charge trapping structure, a second insulating layer, and a gate electrode. The charge trapping structure is composed of a first layer, which may include materials such as zinc oxide and titanium oxide, and a second layer made of nickel oxide or copper oxide. The design also incorporates a first doped region and a second doped region within the semiconductor substrate, strategically placed on either side of the gate stack. Another patent outlines a similar semiconductor device structure, emphasizing the importance of the P-N junction between the first and second layers, which enhances the device's functionality.
Career Highlights
Wen-Chao Shen is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His role involves developing cutting-edge technologies that push the boundaries of semiconductor applications. His expertise and innovative mindset have positioned him as a key player in the field.
Collaborations
Wen-Chao has collaborated with talented individuals such as I-Chen Huang and Kuang-Hsin Chen. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in semiconductor technology.
Conclusion
Wen-Chao Shen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of the semiconductor industry, making significant strides in device performance and efficiency.